Alternative Lithography: Unleashing the Potentials of by Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor

By Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor Torres (eds.)

Good outdated Gutenberg couldn't have imagined that his innovative printing idea which so drastically contributed to dissemination of information and therefore at the present time 's wealth, might were a resource of suggestion years later. Now, it kind of feels intuitive uncomplicated approach to produce lots of replicates is utilizing a mould to emboss development you wish, yet on the nanoscale not anything is easy: the satan is within the aspect. And this booklet is set the "devil". within the following 17 chapters, the authors-all of them good well-known and lively actors during this rising field-describe the state of the art, this present day 's technological bottlenecks and the clients for micro-contact printing and nanoimprint lithography. Many result of this publication originate from tasks funded by way of the ecu Com­ challenge via its "Nanotechnology info units" (NID) initiative. NID used to be introduced with the target to improve nanoscale units for the time while the crimson­ brick state of affairs of the ITRS roadmap will be reached. It grew to become quickly transparent besides the fact that, that there has been no element to enquire simply substitute units to CMOS, yet what was once rather wanted was once an built-in method that took under consideration extra elements of this hard project. Technologically talking , this intended to have a coherent technique to increase novel units, nanofabrication instruments and circuit & approach architectures on the similar time.

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Additional info for Alternative Lithography: Unleashing the Potentials of Nanotechnology

Sample text

P" the work of S. Chou certainly has stimulated the interest of the nanofabrication community, since expectations were raised, that a low cost nanofabrication technique was at hand . Since then, a number of technical realisations and variations to the process have been developed, which are reviewed in considerable detail. 9 Most of them share a common principle: a pattern is transferred into a fluid layer by embossing the mould into it. Usually a thin polymer layer spun on a silicon substrate is moulded by a sequence of steps, which are schematically depicted in Figure I .

Mould motion, which is transferred into a radial flow of the fluid, vr(r , z), from the disk centre outwards to its circumference. At a given radial distance r from the centre, the fluid motion of a volume element depends not only on the amount of material displaced by the disks, but also on the amount of material moving from the centre outwards . To fulfil the conditions of continuity and conversation of momentum for an incompressible liquid, the velocity has to increase with the radial distance as: (2) The velocity profile causes shear stresses acting between the different fluid layers.

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